China Indigenous EUV Lithography Machine Project
Sector: Advanced Electronics • Location: Shenzhen, China
Source: WION
China's project to develop indigenous Extreme Ultraviolet (EUV) lithography machines for semiconductor manufacturing, aiming to produce functional chips using EUV technology by 2028 and start commercial production by 2030. The project involves Huawei, state-backed research institutes, and engineers formerly associated with ASML.
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Participants
Sponsoring Agency | Obfuscated Data |
Company | Obfuscated Data |
Status
Original status | under development |
Taiyo status | Obfuscated Data |
Taiyo last update | 00-00-0000 |
Available timestamps | 00-00-0000 |
Available timestamp type | Obfuscated Data |
Contact
Contact name | Obfuscated Data |
Phone | 0000000000 |
ObfuscatedData@email.com | |
Address | Obfuscated Data, Obfuscated data, obfuscated data, Obfuscated data |
Description
Description | China's project to develop indigenous Extreme Ultraviolet (EUV) lithography machines for semiconductor manufacturing, aiming to produce functional chips using EUV technology by 2028 and start commercial production by 2030. The project involves Huawei, state-backed research institutes, and engineers formerly associated with ASML. |
Original sub-sector | Obfuscated |
Original Currency | USD |
Original budget | 000000000000000 |
Procurement method | Obfuscated Data |
Budget | 000000000000000 |
Location
Region | Obfuscated |
Country | Obfuscated |
State | Obfuscated Data |
County | Obfuscated |
Location | Obfuscated Data, Obfuscated data, obfuscated data, Obfuscated data |
Source
Source reliability | High |
Data quality score | 100% |
Source | Obfuscated Data |
URL | obfuscated_data,obfuscateddata.com |
More Details
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Article Published Date | Obfuscated Data |