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China's Domestic EUV Lithography Machine Development

Sector: Advanced Electronics • Location: Shenzhen, China

Source: Markets Financial Content

Project
Under Testing

China has completed a prototype Extreme Ultraviolet (EUV) lithography machine as part of its 'Manhattan Project' to achieve chip sovereignty. The prototype, developed with state-driven funding and a whole-of-nation approach, is undergoing testing in a secure laboratory in Shenzhen. Huawei Technologies is testing an alternative Laser Discharge Induced Plasma (LDP) light source at its Dongguan facil

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The project “China's Domestic EUV Lithography Machine Development” is an infrastructure initiative in the Advanced Electronics sector, located in Shenzhen, China. Taiyo aggregates data on it from Markets Financial Content.

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under testing

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Description

Description

China has completed a prototype Extreme Ultraviolet (EUV) lithography machine as part of its 'Manhattan Project' to achieve chip sovereignty. The prototype, developed with state-driven funding and a whole-of-nation approach, is undergoing testing in a secure laboratory in Shenzhen. Huawei Technologies is testing an alternative Laser Discharge Induced Plasma (LDP) light source at its Dongguan facility, with trial production of circuits starting in the third quarter of 2025. The project aims to produce functional chips from the domestic EUV machine by 2028, with 2030 considered a more realistic timeframe for significant commercial output.

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High

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100%

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