China's Indigenous EUV Lithography Project
Sector: Advanced Electronics • Location: Shenzhen, China
Source: WION
China's breakthrough project to develop indigenous Extreme Ultraviolet (EUV) lithography machines for semiconductor manufacturing, challenging the monopoly of Dutch company ASML. The project involves Huawei, state-backed research institutes, and former ASML engineers, aiming to produce functional chips using EUV technology by 2028 and start commercial production by 2030.
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Participants
Sponsoring Agency | Obfuscated Data |
Company | Obfuscated Data |
Status
Original status | under development |
Taiyo status | Obfuscated Data |
Taiyo last update | 00-00-0000 |
Available timestamps | 00-00-0000 |
Available timestamp type | Obfuscated Data |
Contact
Contact name | Obfuscated Data |
Phone | 0000000000 |
ObfuscatedData@email.com | |
Address | Obfuscated Data, Obfuscated data, obfuscated data, Obfuscated data |
Description
Description | China's breakthrough project to develop indigenous Extreme Ultraviolet (EUV) lithography machines for semiconductor manufacturing, challenging the monopoly of Dutch company ASML. The project involves Huawei, state-backed research institutes, and former ASML engineers, aiming to produce functional chips using EUV technology by 2028 and start commercial production by 2030. |
Original sub-sector | Obfuscated |
Original Currency | USD |
Original budget | 000000000000000 |
Procurement method | Obfuscated Data |
Budget | 000000000000000 |
Location
Region | Obfuscated |
Country | Obfuscated |
State | Obfuscated Data |
County | Obfuscated |
Location | Obfuscated Data, Obfuscated data, obfuscated data, Obfuscated data |
Source
Source reliability | High |
Data quality score | 100% |
Source | Obfuscated Data |
URL | obfuscated_data,obfuscateddata.com |
More Details
Project Type | Obfuscated Data |
Article Published Date | Obfuscated Data |