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Emergent Interface Phenomena Enabled by Ferroelectric Oxide Thin Films and Membranes

Sector: Chemical (Industrial) • Location: Lincoln, Nebraska, United States

Source: The Quantum Insider

Project
Awarded

A research project led by Xia Hong at the University of Nebraska–Lincoln to investigate the use of ferroelectric oxides for controlling emergent quantum phases and designing more energy-efficient electronic devices. The project focuses on nanoscale ferroelectric control to reversibly switch material states and engineer new electronic and magnetic behaviors across oxide and van der Waals systems. I

Status
Closed
Sector
Chemical (Industrial), Manufacturing (Industrial), Education, Government
Location
Lincoln, Nebraska, United States of America
Updated
22 Jul 2026
Source
The Quantum Insider

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The project “Emergent Interface Phenomena Enabled by Ferroelectric Oxide Thin Films and Membranes” is an infrastructure initiative in the Chemical (Industrial) sector, located in Lincoln, Nebraska, United States. Taiyo aggregates data on it from The Quantum Insider.

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Sponsoring Agency

Status

Original status

awarded

Taiyo status

Closed

Taiyo last update

2026-07-22

Contact

Not available for this record.

Description

Description

A research project led by Xia Hong at the University of Nebraska–Lincoln to investigate the use of ferroelectric oxides for controlling emergent quantum phases and designing more energy-efficient electronic devices. The project focuses on nanoscale ferroelectric control to reversibly switch material states and engineer new electronic and magnetic behaviors across oxide and van der Waals systems. It includes workforce development and infrastructure investments in Nebraska and South Dakota.

Original sector

Science and Technology

Budget

Location

Country

United States of America (USA)

State

Nebraska

City

Lincoln

Source

Source

The Quantum Insider

URL

More Details

Record type

Project

Sector

Chemical (Industrial), Manufacturing (Industrial), Education, Government

Article published date

2025-11-21

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