NanoFab Reflection High NA EUV Lithography Center
Sector: Advanced Electronics • Location: Albany, New York, United States
Source: Hoodline
NanoFab Reflection is a 310,000-square-foot facility at the Albany NanoTech Complex, housing the nation’s first publicly owned High NA EUV Lithography Center. It supports next-generation chip research and development, creating high-tech jobs and attracting private investment to advance semiconductor innovation.
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Participants
Sponsoring Agency | Obfuscated Data |
Company | Obfuscated Data |
Status
Original status | under construction |
Taiyo status | Obfuscated Data |
Taiyo last update | 00-00-0000 |
Available timestamps | 00-00-0000 |
Available timestamp type | Obfuscated Data |
Contact
Contact name | Obfuscated Data |
Phone | 0000000000 |
ObfuscatedData@email.com | |
Address | Obfuscated Data, Obfuscated data, obfuscated data, Obfuscated data |
Description
Description | NanoFab Reflection is a 310,000-square-foot facility at the Albany NanoTech Complex, housing the nation’s first publicly owned High NA EUV Lithography Center. It supports next-generation chip research and development, creating high-tech jobs and attracting private investment to advance semiconductor innovation. |
Original sub-sector | Obfuscated |
Original Currency | USD |
Original budget | 000000000000000 |
Procurement method | Obfuscated Data |
Budget | 000000000000000 |
Location
Region | Obfuscated |
Country | Obfuscated |
State | Obfuscated Data |
County | Obfuscated |
Location | Obfuscated Data, Obfuscated data, obfuscated data, Obfuscated data |
Source
Source reliability | High |
Data quality score | 100% |
Source | Obfuscated Data |
URL | obfuscated_data,obfuscateddata.com |
More Details
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Article Published Date | Obfuscated Data |