SD/DOT: I229N Polymer Chip Seal Improvements
Sector: Mass Transit • Location: Sioux Falls, South Dakota, United States of America
Source: Dodge USA
I229N I229NF I229 NF (Western Ave) - 0.1 S of I229 Interchange over Big Sioux Rv; I229N - 0.4 N of Exit 7 (Rice St) over Big Sioux Rv Polymer Chip Seal LSDC Overlay, Approach Slabs, Replace Pedestrian Rail
- Status
- Prospective
- Sector
- Mass Transit, Consumer Products, Road, Chemical (Industrial), Rail, Car parking, Commercial, Automotive, Manufacturing (Industrial)
- Location
- Sioux Falls, South Dakota, United States of America
- Updated
- 22 Jul 2026
- Source
- Dodge USA
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Project Information
Participants
| Not available for this record. |
Status
Original status | Planning Schematics |
Taiyo status | Prospective |
Taiyo last update | 2026-07-22 |
Contact
| Not available for this record. |
Description
Description | I229N I229NF I229 NF (Western Ave) - 0.1 S of I229 Interchange over Big Sioux Rv; I229N - 0.4 N of Exit 7 (Rice St) over Big Sioux Rv Polymer Chip Seal LSDC Overlay, Approach Slabs, Replace Pedestrian Rail |
Procurement method | |
Budget |
Location
Country | United States of America (USA) |
State | South Dakota |
City | Sioux Falls |
Source
Source | Dodge USA |
URL |
More Details
Record type | Project |
Sector | Mass Transit, Consumer Products, Road, Chemical (Industrial), Rail, Car parking, Commercial, Automotive, Manufacturing (Industrial) |
Article published date | 2024-10-14 |
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