Elektronenstrahl-Lithographiesystem
Contract award notice · Germany · Last reported Oct 2026
Source: TED Europa
Elektronenstrahl-Lithographieanlage für die Herstellung von Mikro- und Nanostrukturen für die Forschung und Prototypenentwicklung mit hoher Auflösung. Anwendungsfelder reichen von der Herstellung von photonischen Schaltkreisen bis hin zu supraleitenden Quantenschaltkreisen mit Strukturgrößen unter 100nm und einer erforderlichen Genauigkeit im nm-Bereich.
- Status
- Closed
- Sector
- Education
- Location
- Garching, Germany
- Updated
- 3 Nov 2026
- Source
- TED Europa
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Tender Information
Participants
| Not available for this record. |
Status
Original status | contract award notice |
Taiyo status | Closed |
Taiyo last update | 2026-11-03 |
Contact
| Not available for this record. |
Description
Description | Elektronenstrahl-Lithographieanlage für die Herstellung von Mikro- und Nanostrukturen für die Forschung und Prototypenentwicklung mit hoher Auflösung. Anwendungsfelder reichen von der Herstellung von photonischen Schaltkreisen bis hin zu supraleitenden Quantenschaltkreisen mit Strukturgrößen unter 100nm und einer erforderlichen Genauigkeit im nm-Bereich. |
Original sector | Laboratory, optical and precision equipments (excl. glasses), Laboratory, optical and precision equipments (excl. glasses) |
Location
Country | Germany |
City | Garching |
Source
Source | TED Europa |
URL |
More Details
Record type | Tender |
Sector | Education |
Article published date | 2026-10-27 |
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