Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE) System
Sector: Advanced Electronics • Location: European Union
Source: TED Europa
University of Oulu is preparing a purchase of an inductively coupled plasma reactive ion etching (ICP-RIE) system. The system will be used in scientific research to fabricate microstructures for various applications, such as biomedicine, sensor technology, and optics.
For more information, please contact the contracting unit to organize a dialogue by 10.8.2026 at the address: .
- Status
- Prospective
- Sector
- Advanced Electronics, Education
- Location
- Unknown (Europe)
- Updated
- 3 Nov 2026
- Source
- TED Europa
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Tender Information
Participants
| Not available for this record. |
Status
Original status | prior information notice |
Taiyo status | Prospective |
Taiyo last update | 2026-11-03 |
Contact
| Not available for this record. |
Description
Description | University of Oulu is preparing a purchase of an inductively coupled plasma reactive ion etching (ICP-RIE) system. The system will be used in scientific research to fabricate microstructures for various applications, such as biomedicine, sensor technology, and optics. For more information, please contact the contracting unit to organize a dialogue by 10.8.2026 at the address: hankinnat@oulu.fi. Please note that contracting authority is on summer holiday during 11.7.-2.8.2026. |
Original sector | Laboratory, optical and precision equipments (excl. glasses) |
Location
Country | Unknown (Europe) |
Source
Source | TED Europa |
URL |
More Details
Record type | Tender |
Sector | Advanced Electronics, Education |
Article published date | 2026-06-26 |
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