PVD for MRAM
Sector: Tunnel • Location: Belgium
Source: TED Europa
A 300mm wafer compatible, multi-chamber PVD platform designed for high throughput of magnetic tunnel junctions. Additionally, the following PVD and process chamber designs that must be supported are: 1) Multi-cathode PVD chamber 2) a pre-clean chamber to remove native oxides and other contaminants, 3) degass/annealing capability and, 4) a cryogenic stage (<100K) option in, or ex, situ of the P
- Status
- Closed
- Sector
- Tunnel, LNG, Commercial, Chemical (Industrial), Manufacturing (Industrial)
- Location
- Belgium
- Updated
- 3 Nov 2026
- Source
- TED Europa
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Tender Information
Participants
| Not available for this record. |
Status
Original status | contract award notice |
Taiyo status | Closed |
Taiyo last update | 2026-11-03 |
Contact
| Not available for this record. |
Description
Description | A 300mm wafer compatible, multi-chamber PVD platform designed for high throughput of magnetic tunnel junctions. Additionally, the following PVD and process chamber designs that must be supported are: 1) Multi-cathode PVD chamber 2) a pre-clean chamber to remove native oxides and other contaminants, 3) degass/annealing capability and, 4) a cryogenic stage (<100K) option in, or ex, situ of the PVD modules. Furthermore, the platform must be compatible with Front Opening Universal Pods with a 25-slot capacity, including an Equipment Front End Module and load-lock system for wafer loading. Finally, the deposition must be computer controlled and automated following defined recipes. As an optional, the platform should be compatible with automatic recipe upload from fab management software via a standardized protocol, for example SECS/GEM. |
Original sector | Laboratory, optical and precision equipments (excl. glasses) |
Location
Country | Belgium |
Source
Source | TED Europa |
URL |
More Details
Record type | Tender |
Sector | Tunnel, LNG, Commercial, Chemical (Industrial), Manufacturing (Industrial) |
Article published date | 2026-03-10 |
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